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Dimethyldichlorosilane is a tetrahedral organosilicon compound with the formula Si(CH 3) 2 Cl 2. At room temperature it is a colorless liquid that readily reacts with water to form both linear and cyclic Si-O chains. Dimethyldichlorosilane is made on an industrial scale as the principal precursor to dimethylsilicone and polysilane compounds.
2 CH 3 Cl + Si → (CH 3) 4−n SiCl n + other products While this reaction is the standard in industrial silicone production and is nearly identical to the first direct synthesis of methyltrichlorosilane, the overall process is inefficient with respect to methyltrichlorosilane. [ 2 ]
The chemical formula of PDMS is CH 3 [Si(CH 3) 2 O] n Si(CH 3) 3, where n is the number of repeating monomer [Si(CH 3) 2 O] units. [4] Industrial synthesis can begin from dimethyldichlorosilane and water by the following net reaction:
CH 3 SiCl 3 + 3 CH 3 OH → CH 3 Si(OCH 3) 3 + 3 HCl. Alcoholysis of alkylchlorosilanes typically proceeds via an S N 2 mechanism. Inversion of the configuration is favored during nucleophilic attack when displacing good leaving groups, such as chloride. [3] In contrast, displacement of poor leaving groups, such as alkoxide, retention is ...
Si + 3 HCl → HCl 3 Si + H 2. Yields of 80-90% can be achieved. The main byproducts are silicon tetrachloride (chemical formula SiCl 4), hexachlorodisilane (Si 2 Cl 6) and dichlorosilane (H 2 SiCl 2), from which trichlorosilane can be separated by distillation. Tank car of trichlorosilane. UN number: 2988 (Chlorosilanes).
The vapor pressure function according to Antoine is obtained as log 10 (P/1 bar) = A − B/(T + C) (P in bar, T in K) with A = 5.44591, B = 1767.766 K and C = −44.888 K in a temperature range from 291 K to 358 K. [2] Below the melting point at −4.5 °C, [12] The 1 H NMR in CDCl 3 shows a singlet at δ=0.14 ppm.
The Si-H bond is reactive. Being a gas, it is less commonly used as a reagent than the related triethylsilane , which is a liquid at room temperature. Trimethylsilane is used in the semiconductor industry as precursor to deposit dielectrics and barrier layers via plasma-enhanced chemical vapor deposition (PE-CVD). [ 1 ]
2,2,2-Trichloroethanol is the chemical compound with formula Cl 3 C−CH 2 OH. Its molecule can be described as that of ethanol, with the three hydrogen atoms at position 2 (the methyl group) replaced by chlorine atoms. It is a clear flammable liquid at room temperature, colorless when pure but often with a light yellow color. [1] [2]