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Distinguishing features of HIPIMS are a high degree of ionisation of the sputtered metal and a high rate of molecular gas dissociation which result in high density of deposited films. The ionization and dissociation degree increase according to the peak cathode power. The limit is determined by the transition of the discharge from glow to arc ...
High-energy ions emitted from plasma thrusters sputter material off the surrounding test chamber, causing problems for ground testing of high-power thrusters. [ 1 ] In physics, sputtering is a phenomenon in which microscopic particles of a solid material are ejected from its surface, after the material is itself bombarded by energetic particles ...
Sputter coating in scanning electron microscopy is a sputter deposition process [clarification needed] to cover a specimen with a thin layer of conducting material, typically a metal, such as a gold/palladium (Au/Pd) alloy. A conductive coating is needed to prevent charging of a specimen with an electron beam in conventional SEM mode (high ...
Evaporative deposition: the material to be deposited is heated to a high vapor pressure by electrical resistance heating in "high" vacuum. [4] [5] Close-space sublimation, the material, and substrate are placed close to one another and radiatively heated. Pulsed laser deposition: a high-power laser ablates material from the target into a vapor.
For a fusion reactor to be viable, it must have a robust boundary solution that addresses several key challenges simultaneously: managing power exhaust to keep wall heat loads within material limits, ensuring efficient removal of fusion ash by maintaining sufficient neutral pressure for pumping, minimizing the sputtering of high-Z impurities (e ...
Sputter cleaning has been used since the 1950's for cleaning scientific surfaces. In the 1970's, high-rate DC magnetron sputtering has shown that bombardment densified the films and helped the hardness of materials. As we further progressed, we learned in 1983 that bombardment was used as concurrent bombardment of inserted gas ions. [4]
High-density plasma deposition of silicon dioxide from silane and oxygen/argon has been widely used to create a nearly hydrogen-free film with good conformality over complex surfaces, the latter resulting from intense ion bombardment and consequent sputtering of the deposited molecules from vertical onto horizontal surfaces [citation needed].
High beta fusion reactor; High-energy nuclear physics; High-frequency Active Auroral Research Program; High harmonic generation; High-intensity discharge lamp; High Power Impulse Magnetron Sputtering; High voltage; HiPER, High-Power laser Energy Research facility; Hiss (electromagnetic), Plasmaspheric hiss; Hollow cathode effect; Hollow-cathode ...