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  2. Plasma cutting - Wikipedia

    en.wikipedia.org/wiki/Plasma_cutting

    Plasma cutting. Plasma cutting is a process that cuts through electrically conductive materials by means of an accelerated jet of hot plasma. Typical materials cut with a plasma torch include steel, stainless steel, aluminum, brass and copper, although other conductive metals may be cut as well. Plasma cutting is often used in fabrication shops ...

  3. Plasma globe - Wikipedia

    en.wikipedia.org/wiki/Plasma_globe

    A plasma ball with filaments extending between the inner and outer spheres. A plasma ball, plasma globe, or plasma lamp is a clear glass container filled with noble gases, usually a mixture of neon, krypton, and xenon, that has a high-voltage electrode in the center of the container. When voltage is applied, a plasma is formed within the container.

  4. Pinch (plasma physics) - Wikipedia

    en.wikipedia.org/wiki/Pinch_(plasma_physics)

    Basic mechanism. This is a basic explanation of how a pinch works. (1) Pinches apply a high voltage and current across a tube. This tube is filled with a gas, typically a fusion fuel such as deuterium. If the product of the voltage & the charge is higher than the ionization energy of the gas the gas ionizes. (2) Current jumps across this gap.

  5. Atmospheric-pressure plasma - Wikipedia

    en.wikipedia.org/wiki/Atmospheric-pressure_plasma

    Atmospheric-pressure plasma. An atmospheric-pressure plasma jet formed by helium flowing through a concentric dielectric barrier discharge (DBD) Atmospheric-pressure plasma (or AP plasma or normal pressure plasma) is a plasma in which the pressure approximately matches that of the surrounding atmosphere – the so-called normal pressure.

  6. Plasma etching - Wikipedia

    en.wikipedia.org/wiki/Plasma_etching

    A plasma etcher, or etching tool, is a tool used in the production of semiconductor devices. A plasma etcher produces a plasma from a process gas, typically oxygen or a fluorine -bearing gas, using a high frequency electric field, typically 13.56 MHz. A silicon wafer is placed in the plasma etcher, and the air is evacuated from the process ...

  7. Plasma cleaning - Wikipedia

    en.wikipedia.org/wiki/Plasma_cleaning

    Plasma cleaning. Fig. 1. The surface of a MEMS device is cleaned with bright, blue oxygen plasma in a plasma etcher to rid it of carbon contaminants. (100mTorr, 50W RF) Plasma cleaning is the removal of impurities and contaminants from surfaces through the use of an energetic plasma or dielectric barrier discharge (DBD) plasma created from ...

  8. Plasma modeling - Wikipedia

    en.wikipedia.org/wiki/Plasma_modeling

    Plasma modeling. Plasma modeling refers to solving equations of motion that describe the state of a plasma. It is generally coupled with Maxwell's equations for electromagnetic fields or Poisson's equation for electrostatic fields. There are several main types of plasma models: single particle, kinetic, fluid, hybrid kinetic/fluid, gyrokinetic ...

  9. Plasma processing - Wikipedia

    en.wikipedia.org/wiki/Plasma_processing

    Plasma processing is a plasma -based material processing technology that aims at modifying the chemical and physical properties of a surface. [1] Plasma processing techniques include: Related topics are plasma chemistry, chemical vapor deposition, and physical vapor deposition processes like sputter deposition, plasma iondoping, vacuum ...

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