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A klecksograph by Justinus Kerner, published 1879. Klecksography is the art of making images from inkblots (German Tinten-Klecks). [1] The work was pioneered by Justinus Kerner, who included klecksographs in his books of poetry. [2]
Rorschach (Walter Joseph Kovacs) is a fictional antihero and one of the protagonists in the graphic novel limited series Watchmen, published by DC Comics in 1986. Rorschach was created by writer Alan Moore with artist Dave Gibbons; as with most of the main characters in the series, he was an analogue for a Charlton Comics character; in this case, Steve Ditko's the Question.
Location refers to how much of the inkblot was used to answer the question. Administrators score the response "W" if the whole inkblot was used to answer the question, "D" if a commonly described part of the blot was used, "Dd" if an uncommonly described or unusual detail was used, or "S" if the white space in the background was used.
An ink blot test is a personality test that involves the evaluation of a subject's response to ambiguous ink blots. This test was published in 1921 by Swiss psychiatrist Hermann Rorschach . The interpretation of people's responses to the Rorschach Inkblot Test was originally based on psychoanalytical theory but investigators have used it in an ...
The Holtzman Inkblot Technique (HIT), also known as the Holtzman Inkblot Test, is an ink blot test aimed at detecting personality and was conceived by Wayne H. Holtzman and colleagues. It was first introduced in 1961 as a projective personality test similar to the Rorschach test. The HIT is a standardized measurement.
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Maskless lithography has two approaches to project a pattern: rasterized and vectorized. In the first one it utilizes generation of a time-variant intermittent image on an electronically modifiable (virtual) mask that is projected with known means (also known as laser direct imaging and other synonyms). In the vectored approach, direct writing ...
A photomask (also simply called a mask) is an opaque plate with transparent areas that allow light to shine through in a defined pattern. Photomasks are commonly used in photolithography for the production of integrated circuits (ICs or "chips") to produce a pattern on a thin wafer of material (usually silicon ).