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Location refers to how much of the inkblot was used to answer the question. Administrators score the response "W" if the whole inkblot was used to answer the question, "D" if a commonly described part of the blot was used, "Dd" if an uncommonly described or unusual detail was used, or "S" if the white space in the background was used.
An ink blot test is a personality test that involves the evaluation of a subject's response to ambiguous ink blots. This test was published in 1921 by Swiss psychiatrist Hermann Rorschach . The interpretation of people's responses to the Rorschach Inkblot Test was originally based on psychoanalytical theory but investigators have used it in an ...
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A klecksograph by Justinus Kerner, published 1879. Klecksography is the art of making images from inkblots (German Tinten-Klecks). [1] The work was pioneered by Justinus Kerner, who included klecksographs in his books of poetry. [2]
The Holtzman Inkblot Technique (HIT), also known as the Holtzman Inkblot Test, is an ink blot test aimed at detecting personality and was conceived by Wayne H. Holtzman and colleagues. It was first introduced in 1961 as a projective personality test similar to the Rorschach test. The HIT is a standardized measurement.
Solder mask is traditionally green, but is also available in many other colors. [2] Solder mask comes in different media depending upon the demands of the application. The lowest-cost solder mask is epoxy liquid that is silkscreened through the pattern onto the PCB. Other types are the liquid photoimageable solder mask (LPSM or LPI) inks and ...
An episodic video game, Watchmen: The End Is Nigh, was released to coincide with the film's release. DC Comics published Before Watchmen , a series of nine prequel miniseries, in 2012, and Doomsday Clock , a 12-issue limited series and sequel to the original Watchmen series, from 2017 to 2019 – both without Moore's or Gibbons' involvement.
Use of a hardmask involves an additional deposition process, and hence additional cost. First, the hardmask material is deposited and etched into the required pattern using a standard photoresist process. Following that the underlying material can be etched through the hardmask. Finally the hardmask is removed with a further etching process. [2]