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Plasma Based Deposition In Which
Ions Are Accelerated Toward Target
- Thermal Evaporation
Physical Vapor Deposition Technique
Used To Form Thin Film Coatings
- Electron Beam Evaporation
Time-Tested Deposition Technology
For Producing High Purity Coatings
- Chemical Vapor Deposition
Deposit Conformal Films Without
The Need For High Vacuum Pumps
- Magnetron Sputtering
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IBA (Ion Beam Applications SA) is a medical technology company based in Louvain-la-Neuve. The company was founded in 1986 by Yves Jongen within the Cyclotron Research Center of the University of Louvain (UCLouvain) and became a university spin-off. It employs about 1500 people in 40 locations. [1]
A second accelerator, called CYCLONE30, was designed and built by the Cyclotron Research Centre team between 1984 and 1987: mainly designed for industrial and medical applications, it is mainly used for isotope production. [15] [16] Further models of CYCLONE30 were built by Ion Beam Applications. [17]
Ion beam application, etching, or sputtering, is a technique conceptually similar to sandblasting, but using individual atoms in an ion beam to ablate a target. Reactive ion etching is an important extension that uses chemical reactivity to enhance the physical sputtering effect.
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Ion beam analysis (IBA) is an important family of modern analytical techniques involving the use of MeV ion beams to probe the composition and obtain elemental depth profiles in the near-surface layer of solids. IBA is not restricted to MeV energy ranges.
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