Search results
Results from the WOW.Com Content Network
Extreme ultraviolet lithography (EUVL, also known simply as EUV) is a technology used in the semiconductor industry for manufacturing integrated circuits (ICs). It is a type of photolithography that uses 13.5 nm extreme ultraviolet (EUV) light from a laser-pulsed tin (Sn) plasma to create intricate patterns on semiconductor substrates.
A low-pressure mercury-vapor discharge tube floods the inside of a biosafety cabinet with shortwave UV light when not in use, killing microbes on irradiated surfaces. Ultraviolet germicidal irradiation (UVGI) is a disinfection technique employing ultraviolet (UV) light, particularly UV-C (180–280 nm), to kill or inactivate microorganisms.
A germicidal lamp (also known as disinfection lamp or sterilizer lamp) is an electric light that produces ultraviolet C (UVC) light. This short-wave ultraviolet light disrupts DNA base pairing, causing formation of pyrimidine dimers, and leads to the inactivation of bacteria, viruses, and protozoans. It can also be used to produce ozone for ...
Photolithography (also known as optical lithography) is a process used in the manufacturing of integrated circuits. It involves using light to transfer a pattern onto a substrate, typically a silicon wafer. The process begins with a photosensitive material, called a photoresist, being applied to the substrate.
UV curing is adaptable to printing, coating, decorating, stereolithography, and in the assembly of a variety of products and materials. UV curing is a low-temperature, high speed, and solventless process as curing occurs via polymerization. [ 2 ] Originally introduced in the 1960s, this technology has streamlined and increased automation in ...
Nanoimprint lithography. A diffractive beam splitter with three-dimensional structure created using nanoimprint lithography. Nanoimprint lithography (NIL) is a method of fabricating nanometer -scale patterns. It is a simple nanolithography process with low cost, high throughput and high resolution.
Maskless lithography. Maskless lithography (MPL) is a photomask -less photolithography -like technology used to project or focal-spot write the image pattern onto a chemical resist-coated substrate (e.g. wafer) by means of UV radiation or electron beam. [1]
Ultraviolet (UV) light is electromagnetic radiation of wavelengths of 10–400 nanometers, shorter than that of visible light, but longer than X-rays. UV radiation is present in sunlight, and constitutes about 10% of the total electromagnetic radiation output from the Sun. It is also produced by electric arcs, Cherenkov radiation, and ...