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  2. Copper electroplating - Wikipedia

    en.wikipedia.org/wiki/Copper_electroplating

    Copper plating on aluminium. Copper electroplating is the process of electroplating a layer of copper onto the surface of a metal object. Copper is used both as a standalone coating and as an undercoat onto which other metals are subsequently plated. [1]

  3. Electrophoretic deposition - Wikipedia

    en.wikipedia.org/wiki/Electrophoretic_deposition

    The primary electrochemical process which occurs during aqueous electrodeposition is the electrolysis of water. This can be shown by the following two half reactions which occur at the two electrodes: Anode: 2H 2 O → O 2 (gas) + 4H(+) + 4e(-) Cathode: 4H 2 O + 4e(-) → 4OH(-) + 2H 2 (gas)

  4. Electroplating - Wikipedia

    en.wikipedia.org/wiki/Electroplating

    Electroplating, also known as electrochemical deposition or electrodeposition, is a process for producing a metal coating on a solid substrate through the reduction of cations of that metal by means of a direct electric current.

  5. Copper interconnects - Wikipedia

    en.wikipedia.org/wiki/Copper_interconnects

    For the Cu deposition (i.e. an additive manufacturing process), the IBM team in the late 1990’s selected electroplating. This started the ‘copper revolution” in the semiconductor / microchip industry. The copper plating starts with coating the walls of a via with a protective layer (Ta, TaN, SiN or SiC), that prevents Cu diffusion into ...

  6. Electrometallurgy - Wikipedia

    en.wikipedia.org/wiki/Electrometallurgy

    Metal powder production by electrodeposition is included in this category, or sometimes electrowinning, or a separate category depending on application. [2] Electroplating, the deposition of a layer of one metal on another [2] Electroforming, the manufacture of, usually thin, metal parts through electroplating [2]

  7. Atomic layer deposition - Wikipedia

    en.wikipedia.org/wiki/Atomic_layer_deposition

    Copper metal ALD has attracted much attention due to the demand for copper as an interconnect material [citation needed] and the relative ease by which copper can be deposited thermally. [27] Copper has a positive standard electrochemical potential [ 28 ] and is the most easily reduced metal of the first-row transition metals.

  8. Electrowinning - Wikipedia

    en.wikipedia.org/wiki/Electrowinning

    In electrowinning, an electrical current is passed from an inert anode through a leach solution containing the dissolved metal ions so that the metal is recovered as it is reduced and deposited in an electroplating process onto the cathode. In electrorefining, the anode consists of the impure metal (e.g., copper) to be refined. The impure ...

  9. Double layer (surface science) - Wikipedia

    en.wikipedia.org/wiki/Double_layer_(surface_science)

    Electron transfer occurs first to make the “neutral” atoms on solid surface become charged, i.e., the formation of ions. In the second step, if there are ions existing in the liquid, such as H + and OH – , the loosely distributed negative ions in the solution would be attracted to migrate toward the surface bonded ions due to ...