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Most widespread instruments are using liquid metal ion sources (LMIS), especially gallium ion sources. Ion sources based on elemental gold and iridium are also available. In a gallium LMIS, gallium metal is placed in contact with a tungsten needle, and heated gallium wets the tungsten and flows to the tip of the needle, where the opposing forces of surface tension and electric field form the ...
Systems of electrostatic lenses can be designed in the same way as optical lenses, so electrostatic lenses easily magnify or converge the electron trajectories. An electrostatic lens can also be used to focus an ion beam, for example to make a microbeam for irradiating individual cells .
An ion beam is a beam of ions, a type of charged particle beam. Ion beams have many uses in electronics manufacturing (principally ion implantation) and other industries. There are many ion beam sources, some derived from the mercury vapor thrusters developed by NASA in the 1960s. The most widely used ion beams are of singly-charged ions.
The einzel lens principle in a simplified form was also used as a focusing mechanism in display and television cathode ray tubes, [3] [4] and has the advantage of providing a good sharply focused spot throughout the useful life of the tube's electron gun, with minimal or no readjustment needed (many monochrome TVs did not have or need focus controls), although in high-resolution monochrome ...
Ion-beam lithography, or ion-projection lithography, is similar to Electron beam lithography, but uses much heavier charged particles, ions. In addition to diffraction being negligible, ions move in straighter paths than electrons do both through vacuum and through matter, so there seems be a potential for very high resolution.
With CFP positioning on the line in many of these games, here is how to watch all of the action today that will shape the playoff.
Photo: The MaMFIS operating at electron beam energy of up to 4 keV and electron current density of about 20 kA/cm 2. Main Magnetic Focus Ion Source (MaMFIS) is a compact ion source with extremely high electron current density. The device is designed for production of ions of arbitrary elements in any charge states, in particular, of highly ...
Ion beam deposition (IBD) is a process of applying materials to a target through the application of an ion beam. [1] Ion beam deposition setup with mass separator. An ion beam deposition apparatus typically consists of an ion source, ion optics, and the deposition target. Optionally a mass analyzer can be incorporated. [2]