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  2. Tantalum(V) ethoxide - Wikipedia

    en.wikipedia.org/wiki/Tantalum(V)_ethoxide

    These materials have semiconductor, [12] electrochromic, [15] and optical [10] applications. Tantalum(V) oxide films have a variety of applications including as optical films with refractive indices as high as 2.039 [ 16 ] and as a thin-film dielectric material in dynamic random access memory and semiconductor field-effect transistors . [ 12 ]

  3. Tantalum pentoxide - Wikipedia

    en.wikipedia.org/wiki/Tantalum_pentoxide

    Tantalum ores often contain significant amounts of niobium, which is itself a valuable metal.As such, both metals are extracted so that they may be sold. The overall process is one of hydrometallurgy and begins with a leaching step; in which the ore is treated with hydrofluoric acid and sulfuric acid to produce water-soluble hydrogen fluorides, such as the heptafluorotantalate.

  4. List of metal-organic chemical vapour deposition precursors

    en.wikipedia.org/wiki/List_of_metal-organic...

    A productive overview is provided by several exceptional reviews covering fields of MOCVD such as, for instance, epitaxial growth of semiconductor compounds, [2] [3] [4] and low temperature deposition of metals. [5] [6] An overview of metal-organic compounds used for the MOCVD growth of different kind of materials is reported in the following ...

  5. Metalorganic vapour-phase epitaxy - Wikipedia

    en.wikipedia.org/wiki/Metalorganic_vapour-phase...

    In the metal organic chemical vapor deposition (MOCVD) technique, reactant gases are combined at elevated temperatures in the reactor to cause a chemical interaction, resulting in the deposition of materials on the substrate. A reactor is a chamber made of a material that does not react with the chemicals being used.

  6. Physical vapor deposition - Wikipedia

    en.wikipedia.org/wiki/Physical_vapor_deposition

    Physical vapor deposition (PVD), sometimes called physical vapor transport (PVT), describes a variety of vacuum deposition methods which can be used to produce thin films and coatings on substrates including metals, ceramics, glass, and polymers. PVD is characterized by a process in which the material transitions from a condensed phase to a ...

  7. Atomic layer deposition - Wikipedia

    en.wikipedia.org/wiki/Atomic_layer_deposition

    Copper metal ALD has attracted much attention due to the demand for copper as an interconnect material [citation needed] and the relative ease by which copper can be deposited thermally. [27] Copper has a positive standard electrochemical potential [ 28 ] and is the most easily reduced metal of the first-row transition metals.

  8. Deposition (phase transition) - Wikipedia

    en.wikipedia.org/wiki/Deposition_(phase_transition)

    Deposition is the phase transition in which gas transforms into solid without passing through the liquid phase. Deposition is a thermodynamic process . The reverse of deposition is sublimation and hence sometimes deposition is called desublimation .

  9. Electron-beam physical vapor deposition - Wikipedia

    en.wikipedia.org/wiki/Electron-beam_physical...

    The PVD process can be carried out at lower deposition temperatures and without corrosive products, but deposition rates are typically lower. Electron-beam physical vapor deposition, however, yields a high deposition rate from 0.1 to 100 μm/min at relatively low substrate temperatures, with very high material utilization efficiency. The ...