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Physical vapor deposition (PVD), sometimes called physical vapor transport (PVT), describes a variety of vacuum deposition methods which can be used to produce thin films and coatings on substrates including metals, ceramics, glass, and polymers. PVD is characterized by a process in which the material transitions from a condensed phase to a ...
Sputter deposition is a physical vapor deposition (PVD) method of thin film deposition by the phenomenon of sputtering. This involves ejecting material from a "target" that is a source onto a "substrate" such as a silicon wafer. Resputtering is re-emission of the deposited material during the deposition process by ion or atom bombardment. [1] [2]
An electronic symbol is a pictogram used to represent various electrical and electronic devices or functions, such as wires, batteries, resistors, and transistors, in a schematic diagram of an electrical or electronic circuit. These symbols are largely standardized internationally today, but may vary from country to country, or engineering ...
A semiconductor device that produces coherent laser radiation when properly energized. leakage inductance The inductance of a transformer that results from magnetic flux not linked by both primary and secondary windings. light-emitting diode A semiconductor device that produces light or infrared or ultraviolet radiation when properly energized.
semiconductor – a material with an electrical conductivity value falling between that of a conductor and an insulator; its resistivity falls as its temperature rises; silicon – the semiconductor material used most frequently as a substrate in electronics; silicon on insulator (SoI) – a layered silicon–insulator–silicon substrate
ZrN grown by physical vapor deposition (PVD) is a light gold color similar to elemental gold. ZrN has a room-temperature electrical resistivity of 12.0 μΩ·cm, a temperature coefficient of resistivity of 5.6·10 −8 Ω·cm/K, a superconducting transition temperature of 10.4 K, and a relaxed lattice parameter of 0.4575 nm.
The IEEE 315 standard contains a list of Class Designation Letters to use for electrical and electronic assemblies. For example, the letter R is a reference prefix for the resistors of an assembly, C for capacitors, K for relays. Industrial electrical installations often use reference designators according to IEC 81346.
DC plasma (violet) enhances the growth of carbon nanotubes in a laboratory-scale PECVD (plasma-enhanced chemical vapor deposition) apparatus. Chemical vapor deposition (CVD) is a vacuum deposition method used to produce high-quality, and high-performance, solid materials.