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  2. Photomask - Wikipedia

    en.wikipedia.org/wiki/Photomask

    The costs of creating new mask shop for 180 nm processes were estimated in 2005 as $40 million, and for 130 nm - more than $100 million. [26] The purchase price of a photomask, in 2006, could range from $250 to $100,000 [27] for a single high-end phase-shift mask. As many as 30 masks (of varying price) may be required to form a complete mask set.

  3. Photoresist - Wikipedia

    en.wikipedia.org/wiki/Photoresist

    Contrast is the difference from exposed portion to unexposed portion. The higher the contrast is, the more obvious the difference between exposed and unexposed portions would be. Sensitivity Sensitivity is the minimum energy that is required to generate a well-defined feature in the photoresist on the substrate, measured in mJ/cm 2. The ...

  4. Stepper - Wikipedia

    en.wikipedia.org/wiki/Stepper

    A variety of reticles, each appropriate for one stage in the process, are contained in a rack in the reticle loader, usually located at the upper front of the stepper. Before the wafer is exposed a reticle is loaded onto the reticle stage by a robot, where it is also very precisely aligned. Since the same reticle can be used to expose many ...

  5. Photolithography - Wikipedia

    en.wikipedia.org/wiki/Photolithography

    The difference between steppers and scanners is that, during exposure, a scanner moves the photomask and the wafer simultaneously, while a stepper only moves the wafer. Contact, proximity and projection Mask aligners preceded steppers [39] [40] and do not move the photomask nor the wafer during exposure and use masks that cover the entire wafer.

  6. Optical proximity correction - Wikipedia

    en.wikipedia.org/wiki/Optical_proximity_correction

    An illustration of OPC (Optical Proximity Correction). The blue Γ-like shape is what chip designers would like printed on a wafer, in green is the pattern on a mask after applying optical proximity correction, and the red contour is how the shape actually prints on the wafer (quite close to the desired blue target).

  7. Phase-shift mask - Wikipedia

    en.wikipedia.org/wiki/Phase-shift_mask

    When the thickness is suitably chosen, the interference of the phase-shifted light with the light coming from unmodified regions of the mask has the effect of improving the contrast on some parts of the wafer, which may ultimately increase the resolution on the wafer. The ideal case is a phase shift of 180 degrees, which results in all the ...

  8. We Ask a Derm: What's the Difference Between An Eye Cream ...

    www.aol.com/entertainment/ask-derm-whats...

    And an eye mask works both morning or night to boost hydration and wake up tired skin. Whether you go with an eye cream or an eye gel, Sussman recommends using it daily for best results.

  9. Striplight - Wikipedia

    en.wikipedia.org/wiki/Striplight

    A strip light is a multi-circuit stage lighting instrument. [1] Striplights are one of the most basic types of lighting fixtures available. They usually consist of row of lamps. A single striplight is usually wired internally into either three or four circuits. Each internal circuit consists of several lamps evenly spaced within the unit.