Search results
Results from the WOW.Com Content Network
Cathodic arc deposition or Arc-PVD is a physical vapor deposition technique in which an electric arc is used to vaporize material from a cathode target. The vaporized material then condenses on a substrate, forming a thin film. The technique can be used to deposit metallic, ceramic, and composite films.
The Hull cell is a type of test cell used to semi-quantitatively check the condition of an electroplating bath. It measures useable current density range, optimization of additive concentration, recognition of impurity effects, and indication of macro throwing power capability. [14] The Hull cell replicates the plating bath on a lab scale.
The coating temperature has an effect on the bath conductivity and deposited film conductivity, which increases as temperature increases. Temperature also has an effect on the viscosity of the deposited film, which in turn affects the ability of the deposited film to release the gas bubbles being formed.
You are free: to share – to copy, distribute and transmit the work; to remix – to adapt the work; Under the following conditions: attribution – You must give appropriate credit, provide a link to the license, and indicate if changes were made. You may do so in any reasonable manner, but not in any way that suggests the licensor endorses ...
The PVD process can be carried out at lower deposition temperatures and without corrosive products, but deposition rates are typically lower. Electron-beam physical vapor deposition, however, yields a high deposition rate from 0.1 to 100 μm/min at relatively low substrate temperatures, with very high material utilization efficiency. The ...
The unshaded bars indicate the location on the chart of those steels when in acidic/stagnant water ( like in the bilge ), where crevice-corrosion happens. Notice how the *same* steel has much different galvanic-series location, depending on the electrolyte it's in, making prevention of corrosion .. more difficult.
It can be used for electrochemical deposition of thin films or for determining suitable reduction potential range of the ions present in electrolyte for electrochemical deposition. [13] CV can also be used to determine the electron stoichiometry of a system, the diffusion coefficient of an analyte, and the formal reduction potential of an ...
You are free: to share – to copy, distribute and transmit the work; to remix – to adapt the work; Under the following conditions: attribution – You must give appropriate credit, provide a link to the license, and indicate if changes were made.