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The SI unit of molar absorption coefficient is the square metre per mole (m 2 /mol), but in practice, quantities are usually expressed in terms of M −1 ⋅cm −1 or L⋅mol −1 ⋅cm −1 (the latter two units are both equal to 0.1 m 2 /mol).
Extinction coefficient refers to several different measures of the absorption of light in a medium: Attenuation coefficient , sometimes called "extinction coefficient" in meteorology or climatology Mass extinction coefficient , how strongly a substance absorbs light at a given wavelength, per mass density
The first molar ionization energy applies to the neutral atoms. The second, third, etc., molar ionization energy applies to the further removal of an electron from a singly, doubly, etc., charged ion. For ionization energies measured in the unit eV, see Ionization energies of the elements (data page). All data from rutherfordium onwards is ...
A. R. Forouhi and I. Bloomer deduced dispersion equations for the refractive index, n, and extinction coefficient, k, which were published in 1986 [1] and 1988. [2] The 1986 publication relates to amorphous materials, while the 1988 publication relates to crystalline.
From an avoided double redirect: This is a redirect from an alternative title or related topic of Molar extinction coefficient, another redirect to the same title. Because double redirects are disallowed, both pages currently point to Molar absorption coefficient .
Note that the especially high molar values, as for paraffin, gasoline, water and ammonia, result from calculating specific heats in terms of moles of molecules. If specific heat is expressed per mole of atoms for these substances, none of the constant-volume values exceed, to any large extent, the theoretical Dulong–Petit limit of 25 J⋅mol ...
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Mask ROM consists of a grid of word lines (the address input) and bit lines (the data output), selectively joined with transistor switches, and can represent an arbitrary look-up table with a regular physical layout and predictable propagation delay. Mask ROM is programmed with photomasks in photolithography during semiconductor manufacturing.