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Extreme ultraviolet lithography (EUVL, also known simply as EUV) is a technology used in the semiconductor industry for manufacturing integrated circuits (ICs). It is a type of photolithography that uses 13.5 nm extreme ultraviolet (EUV) light from a laser-pulsed tin (Sn) plasma to create intricate patterns on semiconductor substrates.
X-ray generators produce X-rays by applying a high voltage between the cathode and the anode of an X-ray tube and in heating the tube filament to start the electron emission. The electrons are then accelerated in the resulting electric potential and collide with the anode, which is usually made of Tungsten .
Gamma-ray sensors are also used for measuring the fluid levels in water and oil industries. [17] Typically, these use Co-60 or Cs-137 isotopes as the radiation source. In the US, gamma ray detectors are beginning to be used as part of the Container Security Initiative (CSI). These machines are advertised to be able to scan 30 containers per hour.