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Lasers emitting wavelengths below 445 nm appear violet, but are nonetheless also called blue lasers. Violet light's 405 nm short wavelength, on the visible spectrum, causes fluorescence in some chemicals, like radiation in the ultraviolet ("black light") spectrum (wavelengths less than 400 nm).
Extreme ultraviolet lithography (EUVL, also known simply as EUV) is a technology used in the semiconductor industry for manufacturing integrated circuits (ICs). It is a type of photolithography that uses 13.5 nm extreme ultraviolet (EUV) light from a laser-pulsed tin (Sn) plasma to create intricate patterns on semiconductor substrates.
Laser types with distinct laser lines are shown above the wavelength bar, while below are shown lasers that can emit in a wavelength range. The height of the lines and bars gives an indication of the maximal power/pulse energy commercially available, while the color codifies the type of laser material (see the figure description for details).
The commonly used deep ultraviolet excimer lasers in lithography systems are the krypton fluoride (KrF) laser at 248 nm wavelength and the argon fluoride laser (ArF) at 193 nm wavelength. The primary manufacturers of excimer laser light sources in the 1980s were Lambda Physik (now part of Coherent, Inc.) and Lumonics.
The filters are selected so that the mean wavelengths of response functions (at which magnitudes are measured to mean precision) are 364 nm for U, 442 nm for B, 540 nm for V. Zero-points were calibrated in the B−V (B minus V) and U−B (U minus B) color indices selecting such A0 main sequence stars which are not affected by interstellar ...
Red (635 nm), blueish violet (445 nm), and green (520 nm) laser pointers. A laser pointer or laser pen is a (typically battery-powered) handheld device that uses a laser diode to emit a narrow low-power visible laser beam (i.e. coherent light) to highlight something of interest with a small bright colored spot.
The n(λ) and k(λ) spectra of each film are obtained along with film thickness, over a wide range of wavelengths from deep ultraviolet to near infrared wavelengths (190–1000 nm). In the following examples, the notation for theoretical and measured reflectance in the spectral plots is expressed as "R-theor" and "R-meas", respectively.
This image shows an early, experimental tool. Extreme ultraviolet radiation ( EUV or XUV ) or high- energy ultraviolet radiation is electromagnetic radiation in the part of the electromagnetic spectrum spanning wavelengths shorter than the hydrogen Lyman-alpha line from 121 nm down to the X-ray band of 10 nm.
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