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  2. Excimer laser - Wikipedia

    en.wikipedia.org/wiki/Excimer_laser

    Historically, from the early 1960s through the mid-1980s, mercury-xenon lamps were used in lithography for their spectral lines at 436, 405 and 365 nm wavelengths. However, with the semiconductor industry's need for both higher resolution (to produce denser and faster chips) and higher throughput (for lower costs), the lamp-based lithography ...

  3. UV curing - Wikipedia

    en.wikipedia.org/wiki/UV_curing

    UV curing is adaptable to printing, coating, decorating, stereolithography, and in the assembly of a variety of products and materials. UV curing is a low-temperature, high speed, and solventless process as curing occurs via polymerization. [2] Originally introduced in the 1960s, this technology has streamlined and increased automation in many ...

  4. Extreme ultraviolet lithography - Wikipedia

    en.wikipedia.org/wiki/Extreme_ultraviolet...

    In the 1960s, visible light was used for the production of integrated circuits, with wavelengths as small as 435 nm (mercury "g line"). Later, ultraviolet (UV) light was used, at first with a wavelength of 365 nm (mercury "i line"), then with excimer wavelengths, first of 248 nm (krypton fluoride laser), then 193 nm (argon fluoride laser), which was called deep UV.

  5. Dental curing light - Wikipedia

    en.wikipedia.org/wiki/Dental_curing_light

    The next type of curing light developed was the quartz-halogen bulb; [4] this device had longer wavelengths of the visible light spectrum and allowed for greater penetration of the curing light and light energy for resin composites. [3] The halogen curing light replaced the UV curing light. The 1990s presented great improvements in light curing ...

  6. Photolithography - Wikipedia

    en.wikipedia.org/wiki/Photolithography

    From the early 1960s through the mid-1980s, Hg lamps had been used in lithography for their spectral lines at 436 nm ("g-line"), 405 nm ("h-line") and 365 nm ("i-line"). However, with the semiconductor industry's need for both higher resolution (to produce denser and faster chips) and higher throughput (for lower costs), lamp-based lithography ...

  7. Mercury-vapor lamp - Wikipedia

    en.wikipedia.org/wiki/Mercury-vapor_lamp

    In medium-pressure mercury-vapor lamps, the lines from 200 to 600 nm are present. The lamps can be constructed to emit primarily in the UV-A (around 400 nm) or UV-C (around 250 nm). High-pressure mercury-vapor lamps are commonly used for general lighting purposes. They emit primarily in the blue and green.

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