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  2. Etching (microfabrication) - Wikipedia

    en.wikipedia.org/wiki/Etching_(microfabrication)

    Etching tanks used to perform Piranha, hydrofluoric acid or RCA clean on 4-inch wafer batches at LAAS technological facility in Toulouse, France. Etching is used in microfabrication to chemically remove layers from the surface of a wafer during manufacturing. Etching is a critically important process module in fabrication, and every wafer ...

  3. Metal assisted chemical etching - Wikipedia

    en.wikipedia.org/.../Metal_assisted_chemical_etching

    The etching solution usually has no preferred direction of attacking the substrate, therefore isotropic etching takes place. In semiconductor engineering, however it is often required that the sidewalls of the etched trenches are steep. This is usually realized with methods that operate in the gas-phase such as reactive ion etching. These ...

  4. Atomic layer etching - Wikipedia

    en.wikipedia.org/wiki/Atomic_layer_etching

    Atomic layer etching (ALE) is an emerging technique in semiconductor manufacture, in which a sequence alternating between self-limiting chemical modification steps which affect only the top atomic layers of the wafer, and etching steps which remove only the chemically-modified areas, allows the removal of individual atomic layers.

  5. Dry etching - Wikipedia

    en.wikipedia.org/wiki/Dry_etching

    Dry etching is used in conjunction with photolithographic techniques to attack certain areas of a semiconductor surface in order to form recesses in material.. Applications include contact holes (which are contacts to the underlying semiconductor substrate), via holes (which are holes that are formed to provide an interconnect path between conductive layers in the layered semiconductor device ...

  6. Semiconductor device fabrication - Wikipedia

    en.wikipedia.org/wiki/Semiconductor_device...

    Removal is any process that removes material from the wafer; examples include etch processes (either wet or dry) and chemical-mechanical planarization (CMP). Patterning is the shaping or altering of deposited materials, and is generally referred to as lithography.

  7. Microfabrication - Wikipedia

    en.wikipedia.org/wiki/Microfabrication

    Simplified illustration of the process of fabrication of a CMOS inverter on p-type substrate in semiconductor microfabrication. Each etch step is detailed in the following image. The diagrams are not to scale, as in real devices, the gate, source, and drain contacts are not normally located in the same plane. Detail of an etch step.

  8. [Latest] Global Semiconductor Equipment Manufacturing Market ...

    lite.aol.com/tech/story/0022/20250206/9352130.htm

    Austin, TX, USA, Feb. 06, 2025 (GLOBE NEWSWIRE) -- Custom Market Insights has published a new research report titled “Semiconductor Equipment Manufacturing Market Size, Trends and Insights By Process (Back-end, Front-end), By Dimension (3D, 2.5D, 2D), By Application (Testing & Inspection, Semiconductor Fabrication Plant/Foundry, Semiconductor Electronics Manufacturing), and By Region ...

  9. etching (etch, etch processing) – chemically removing layers from the surface of a wafer during semiconductor device fabrication fab – a semiconductor fabrication plant fan-out wafer-level packaging – an extension of wafer-level packaging in which the wafer is diced, dies are positioned on a carrier wafer and molded, and then a ...